Capital Equipment

Capital Equipment

As-One Furnace

University of Leeds

Rapid Thermal Annealer Provides Heat Treatment To Semiconductor Wafers To High Temperatures (Up To 1,000°C Or Greater) In A Short Time Of Seconds Or Minutes Before Cooling Down. The Thermal Processes Are Used For A Variety Of Applications Such As Dopant Activation, Metal Diffusion. An Example, As – One Furnace Can Ramp Up To 420°C From Room Temperature In 1.5 Minutes.

No. Available: 1

Contact
Prof Edmund Linfield
Email: E.H.Linfield@leeds.ac.uk