Capital Equipment

Capital Equipment

Electron Beam Lithographer

University College London

Electron Beam Lithography

Raith 150-Two Electron Beam Lithography Resolution 20Nm Electron Beam Resist Processes 495 & 950 Pmma Sample Size From 10 X10Mm Up To 150Mm Diameter

No. Available: 1

Contact
S Huo
Email: s.huo@ucl.ac.uk